Method of sterilizing mildews and / or fungi in the state of spores and sterilization apparatus therefor

ABSTRACT

The present invention relates to a method of sterilizing fungi and bacteria in a spore state for sterilizing fungi and bacteria in a spore state and a sterilizer thereof. In particular, the invention is directed to a method of sterilizing sterilization targets adhering onto target-adhering things such as containers, packing materials, conveying tools, etc. or sterilization targets contained in target-containing things such as liquid, air, raw materials, etc. and also a sterilizing device thereof.  
     Some of fungi and bacteria in a spore state are strong to ultraviolet rays, and some of them are strong to heat. So, both the fungi and so on which are strong to ultraviolet rays and those which are strong to heat can be effectively sterilized by performing successively the sterilization by UV radiation and heat.  
     Sterilization is performed by irradiating ultraviolet rays over sterilization targets like fungi and bacteria in a spore state adhering onto the target-adhering things such as containers, packing materials, etc. to hurt the sterilization targets and then heating them for sterilization.

TECHNICAL FIELD

[0001] The present invention relates to a method of sterilizing fungiand/or bacteria in a spore state for sterilizing fungi and/or bacteriain a spore state, as sterilization targets, which are adhering totarget-adhering things such as containers, packing materials, conveyingtools, etc. or contained in target-containing things such as liquid,air, raw materials, etc. and a sterilizer of thereof.

BACKGROUND ART

[0002] Sterilization of fungi adhering on the surface of containers hasso far been effected by irradiating ultraviolet rays over the containerswhen filling them up with contents such as drinks, pharmaceutical,industrial products, cosmetics before or after filling up. As a methodof sterilizing fungi adhering to the containers, there are generallywell known various applications such as ultraviolet rays sterilizationby irradiation of ultraviolet rays, thermal sterilization by thermalapplication with hot water, heated steam, etc. or chemical sterilizationby application of chemicals.

[0003] However, while conventional applications such as ultraviolet rayssterilization, thermal sterilization or chemical sterilization areeffective only against some of the fungi, there is a problem that asatisfactory effect against other fungi cannot be expected by theseapplications.

[0004] Some fungi show strong tolerance against ultraviolet rays.Examples of these fungi are Chaetomium, Aspergillus and so on.Chaetomium and Aspergillus have the nature that they are strong againstultraviolet rays and also tolerant to some extent against heat, and inaddition they show such powerful cellulolytic activity that ATCC 6205strain is specified as one of the test fungi for fungicides by JapaneseIndustrial Standards (JIS).

[0005] Chaetomium and Aspergillus inhabit paper, pulp, vinyl, wood, etc.in addition to foods such as cereals, margarine and so on or dead leavesand soil by sticking. Their habitation distribution is global, and theyare found all over Japan.

[0006] Further, there are known Bacillus subtilis and the like forming aspore as bacteria which are resistant to heat, though they are notclassified as fungi. As a result of investigations and studies, theinventor of the present invention has found that bacteria in this sporestate are very strong against heat but comparatively vulnerable toultraviolet rays.

[0007] These Chaetomium, Aspergillus and bacteria in the spore stateeasily adhere to a container, a wrapping paper, a packing bag and so onbecause they are contained in dirty atmosphere as well as in soil, dirtywater, and the like. In particular when a containers wears staticelectricity, its adhesive power is so strong that it is necessary tosterilize the container in order to employ the container in a hygienicstate.

[0008] Therefore, the containers used for packing medical supplies,foods or the like are generally sterilized beforehand by means ofultraviolet rays or heat before filling up the containers with thecontents in the filling room.

[0009] In the case where a product is to be manufactured by massproduction, a method of previously producing a large number ofcontainers and then conveying the necessary number of containers intothe filling room is often adopted. A large number of containers arefilled in cardboard boxes, kept in the safekeeping storage, conveyed ina encased state on a production line, picked up from the boxes onto aline conveyer and conveyed into a filling room. Therefore, when, forexample, Chaetomium adheres to a cardboard container and proliferatesthere, the fungi may adhere to a container and are supplied on aproduction line.

[0010] Thus, the sterilization of a container has been performed beforefilling up a container by a filling device. However, Chaetomium,Aspergillus and so on are only hurt by conventional sterilization suchas a method of merely irradiating ultraviolet rays or a method of merelyheating, so that these fungi may not be killed completely, andsufficient sterilization of the container is not conducted.

[0011] As a result, there is a possibility that contents would bepolluted through the container and the like by filling up the contentsinto the container with Chaetomium and the like adhering when filling upthe contents into the container by a filling device. Further, there arepossibilities that Chaetomium and the like move from the container intothe filling room and that the filling room would be polluted withChaetomium and the like, when the container is conveyed into the fillingroom.

[0012] Thus, the present invention has been established in view of theseconventional problems. An object of the invention is to provide a methodof sterilizing fungi and bacteria in a spore state and a sterilizertherefor which comprises enabling to sterilize fungi and bacteria in aspore state by irradiating ultraviolet rays over them to hurt them andheating the fungi and the like, or heating the fungi and the like andthen irradiating ultraviolet rays over them, as a combination of UVradiation and heating, neither UV radiation only nor heating only.

DISCLOSURE OF THE INVENTION

[0013] The present invention is directed to a method of sterilizingfungi and/or bacteria in a spore state which comprises irradiatingultraviolet rays over the portions to be sterilized on target-adheringthings such as containers, packing materials, conveying tools, etc. andon target-containing things such as liquid, air, raw materials, etc. tohurt sterilization targets such as fungi and/or bacteria in a sporestate, which adhere to the target-adhering things or are contained inthe target-containing things, and then heating the sterilization targetsfor sterilization.

[0014] Further, the present invention concerns a method of sterilizingfungi and/or bacteria in a spore state which comprises heating portionsto be sterilized on target-adhering things such as containers, packingmaterials, conveying tools, etc. and on target-containing things such asliquid, air, raw materials, etc. to give thermal stimulation to thesterilization targets such as fungi and/or bacteria in a spore state,which adhere to the target-adhering things or contained in thetarget-containing things and then irradiating ultraviolet rays over thesterilization targets for sterilization.

[0015] In addition, the invention concerns a sterilizer of fungi andbacteria in a spore state which comprises UV radiation means forirradiating ultraviolet rays over portions to be sterilized ontarget-adhering things such as containers, packing materials, conveyingtools, etc. or on target-containing things such as liquid and rawmaterials, etc. to hurt sterilization targets such as fungi and/orbacteria in a spore state, which adhere to the target-adhering things orare contained in the target-containing things, and heating means forheating the sterilization targets having wounds produced by UVradiation.

[0016] Furthermore, this invention relates to a sterilizer of fungi andbacteria in a spore state which comprises heating means for heatingportions to be sterilized on target-adhering things such as containers,packing materials, conveying tools, etc. or on target-containing thingssuch as liquid and raw materials, etc. to give thermal stimulation tosterilization targets such as fungi and/or bacteria in a spore state,which adhere to the target-adhering things or are contained in thetarget-containing things, and UV radiation means to irradiateultraviolet rays over the sterilization targets having received thethermal stimulation.

BRIEF DESCRIPTION OF THE DRAWINGS

[0017]FIG. 1 is a block illustration which shows one embodiment of amethod of sterilizing fungi and bacteria in a spore state of the presentinvention.

[0018]FIG. 2 is an illustration, which shows the constitution of oneembodiment of the sterilizer against fungi and bacteria in a spore stateof the present invention.

BEST MODE FOR CARRYING OUT THE INVENTION

[0019] Preferred embodiments of the present invention will be explainedbelow with reference to the attached drawings. FIG. 1 is a blockillustration which shows the constitution of one embodiment of a methodof sterilizing fungi and bacteria in a spore state of the presentinvention, and FIG. 2 is an illustration which shows the constitution ofone embodiment of a sterilizer against fungi and bacteria in a sporestate of the present invention.

[0020] The method of sterilizing fungi and bacteria in a spore state andthe sterilizer against them of the present invention as shown in FIG. 1and FIG. 2 are applied to fungi and bacteria in a spore state assterilization targets. The “fungi and so on” illustratively includeChaetomium globosum, Aspergillus oryzae and other fungi. Further, the“bacteria and so on in a spore state” illustratively include Bacillussubtilis, Bacillus cereus, and so on, which form spores. In addition,the sterilization targets may be, of course, directed to sterilizationonly for either of the fungi or bacteria in a spore state.

[0021] Target-adhering things to which sterilization targets adhere andtarget containing things are nominated as those that need to sterilizesuch sterilization targets. Here, the “target-adhering things” meanthose which need sterilization because the sterilization targets willoften adhere to the surface of things (inclusive of not only the surfaceof the front side but also the hidden parts such as the back surface ofthe rear side, bottom surface, dented part of the unevenness, etc.).

[0022] The target-adhering things illustratively include “container”capable of receiving drinking water, fruit drink, coffee drink, a liquidmedicine, other liquid, and fixed materials such as processed food,processed vegetables and so on, “packing materials” capable of receivingone or more containers, and “conveying tool” for conveying the packingmaterials. Describing them more concretely, the container includes acontainer main body and a container lid. The container main bodyincludes illustratively a PET bottle, a bottle, a can, a paper pack, aplastic bag, etc. and the container lid includes, for example, a plasticcap, a metal cap (aluminum, steel, etc.), a cork, etc.

[0023] For example, the packing materials include a packing box (whichis made by corrugated cardboard, wood, plastic, etc.), an insidepartition for packing, a wrapping paper, a bag for packing (which ismade by paper, plastic, etc.), the insoles, and so on. Furthermore, thetool for conveyance includes, for example, a conveying palette made byplastic, wood, etc., a conveying board, a cabinet, a casing, and so on.

[0024] In addition, “target-containing things” mean those which need asterilization treatment, because sterilization targets may be oftenimpregnated or incorporated inside thereof. The target-containing thingsillustratively include drinking water such as city water, well water,etc., fruit drink, drink of coffee, other drinks, liquid medicines,health drink, other drugs or unregulated drugs, processed food such asboiled fish paste, sausage, etc., fixed materials such as pickle, otherprocessed vegetables, and so on.

[0025] UV radiation means for irradiating ultraviolet rays over portionsto be sterilized on target-adhering things and target-containing thingsinclude apparatuses which can emit ultraviolet rays having a wavelengthof from 180 nm (nano meter) to 480 nm, for example, UV rays lampemitting ultraviolet rays, light emitting diode (LED) capable ofemitting UV rays likewise, semiconductor laser, and the like.

[0026] In addition, heating means for heating portions to be sterilizedon target-adhering things and target-containing things can be classifiedinto medium heating means capable of heating a sterilization targetthrough a heating medium by heating a medium at a prescribed temperatureand spraying the heated medium over the sterilization target andelectromagnetic wave heating means capable of heating directly thesterilization target by irradiating an electromagnetic wave over thesterilization target to bring about the molecular movement in thesterilization target itself.

[0027] Of the heating means, the medium heating means illustrativelyinclude hot water heating means to use hot water as a heating medium,hot wind heating means to use hot wind as a heating medium and steamheating means to use heated steam as a heating medium. In addition, theelectromagnetic wave heating means include an infrared rays irradiationdevice using an infrared rays lamp capable of emitting infrared rays andfar infrared rays, and a laser irradiation device by using lightemitting diode (LED) capable of emitting also infrared rays, etc. and asemiconductor laser capable of discharging laser light.

[0028] As shown in FIG. 1, the method of sterilizing fungi and bacteriain a spore state is composed of UV Irradiation Zone 2 to irradiate UVover the fungi and bacteria in a spore state (hereinafter referred to as“fungi and so on”) adhering on Container 1 and Heat Treatment Zone 3 toheat the fungi and so on adhering on container 1 which is located in thepost-stage of UV Irradiation Zone 2. Heating Device 4 is installed inHeat Treatment Zone 3 as heating means to the fungi and so on adheringon Container 1, and to the fungi and so on adhering on Container 1 areapplied hot water, steam or hot wind by this Heating Device 4.

[0029] When heated water and steam are applied to the fungi and so onadhering on Container by Heating Device 4, Drying Treatment Zone 5 isprovided in Heat Treatment Zone 3. In this Drying Treatment Zone 5,Drying Device 6 to supply warm wind and hot wind is provided, and dryingis performed by evaporating the water of the hot water and steamremaining in Container 1, applied by Heating Device 4, by supplyingContainer 1 with warm wind or hot wind from this Drying Device 6.

[0030] Furthermore, Washing Treatment Zone 7 and Contents Filling Zone 8are provided at the post-stage of Heat Treatment Zone 3. This WashingTreatment Zone 7 washes away dust, stain, foreign matter, etc. adheringonto Container 1. In Contents Filling Zone 8, contents are filled intoContainer 1 so that Container 1 becomes Product 9 by filling up contentsinto Container 1.

[0031] Fungi and so on adhering onto Container 1 can be sterilized, asshown below, according to the method of sterilizing fungi and so onadhered onto Container 1, as composed in this way. At first, Container 1is transferred to UV Irradiation Zone 2, in which UV is irradiated.Therefore, the fungi and so on adhered onto Container 1 with weaktolerance to ultraviolet rays become extinct, but those with strongtolerance to ultraviolet rays are not killed but only hurt.

[0032] Next, Container 1 is transferred to Heat Treatment Zone 3,wherein heated water, steam or hot wind is applied over Container 1 byHeating Device 4. Container 1 turns over top and bottom, and heatedwater, steam or hot wind is applied over Container 1. Among the fungiand so on adhering onto Container 1, those fungi and bacteria in a sporestate which have not been killed by irradiation of ultraviolet rays arekilled by further application of heat over the wound due to UVradiation. Moreover, incorporation of heated water and steam intoContainer 1 is prevented by turning over Container 1 top and bottom. Asa result, the fungi and so on adhering onto Container 1 is effectivelysterilized.

[0033] When heated water and steam are applied over Container 1 byHeating Device 4 of Heat Treatment Zone 3, Container 1 is transferred toDrying Treatment Zone 5 and dried by supplying warm wind and hot wind bymeans of Drying Device 6. Next, Container 1 is transferred to WashingTreatment Zone 7, wherein dust, dirt, foreign matters and the like arewashed away. It is filled up with contents in Contents Filling Zone 8 togive Product 9. In Heat Treatment Zone 3, this Example is characterizedby applying heated water, steam or hot wind over Container 1 by HeatingDevice 4, but in addition, heated water, steam or hot wind may beintroduced into container 1, and it may be heated.

[0034] As for a method of sterilizing fungi and so on adhering onto acontainer, having a constitution as described above, for example, agerm-free filling device may be used as a sterilization device, as shownin FIG. 2.

[0035] This Germ-free Filling Device 10 is composed of PreliminaryWashing Device 11 to preliminarily wash the container brought in andfill up a germicidal liquid therein, at least two Coming and GoingVibration Conveyers 12 to mutually move to an opposite direction thatare disposed in coupling with Preliminary Washing Device 11,Germicide-removing Outside-washing Device 13 to remove the germicidalliquid by turning the container upside down and wash the outside of thecontainer, being coupled with this Coming and Going Vibration Conveyers12, Germ-free-water Washing Device 14 to wash the inside of thecontainer with germ-free water which is installed in the post-stage ofGermicide-removing Outside-washing Device 13, Filling Device 15 to fillup a container which is coupled with the Germ-free-water Washing Device14 with the contents, and Capping Device 16 to install a cap.

[0036] Further, in Germ-free Filling Device 10, a conveyer, notillustrated, is used as conveying means to each device of a container,and the conveyer and each device are covered by Tunnel 17 in whichaseptic gas is supplied.

[0037] In Germ-free Filling Device 10 having such a constitution,Sterilizer 18 is disposed in an entrance A where a container is carriedin. Thereby, Sterilizer 18 irradiates ultraviolet rays over a containerto be carried into Germ-free Filling Device 10, and further the fungiand so on adhering onto the container is sterilized by applying heatedwater. The container passed through Germ-free Filling Device 10 is madefree of fungi and so on. As a result, incorporation of fungi and so oninto Germ-free Filling Device 10 through a container is avoided bySterilizer 18 so that Germ-free Filling Device 10 may always hold agermfree state.

[0038] Furthermore, Germfree Filling Device 10 may be devided by apartition wall X. Then, Sterilizer 18 can achieve almost the same effectas a heating device by using heated water in Preliminary Washing Device11.

[0039] Moreover, the sterilizer may be disposed at other positions inGermfree Filling Device 10. Thus, Sterilizer 19 of a second example isdisposed in Exit B where the container of Germfree Filling Device 10 iscarried out from, and the penetration of fungi and so on from theoutside is prevented. Therefore, Sterilizer 19 can always keep inside ofGermfree Filling Device 10 germfree.

[0040] Sterilizer 20 of a third example is provided at the pre-stage ofFilling Device 15, whereby any pollution of Filling Device 15 by fungiand so on is prevented. Therefore, Filing Device 15 can preventincorporation of fungi and so on into the contents when filling up thecontainer with the contents.

[0041] Sterilizer 21 of a fourth example is installed in the post-stageof Filling Device 15, whereby any pollution of Filling Device 15 byfungi and so on is prevented. Therefore, Filing Device 15 can preventincorporation of fungi and so on into the contents when filing up thecontainer with the contents.

[0042] Experiments performed by using the devices above-described willbe explained below.

[0043] Experiment 1

[0044] (1) Title of the Test

[0045] Inactivation test by ultraviolet rays sterilization lamp againstBacillus subtilis

[0046] (2) Object

[0047] For confirming tolerance of Bacillus subtilis against ultravioletrays, this test was carried out.

[0048] (3) Test Bacteria and Quantity

[0049]Bacillus subtilis IF013721

[0050] Acquisition Date: Sep. 21, 1999

[0051] (4) Test Condition

[0052] Ultraviolet rays sterilization lamp: SGL-1000T5 HOSHIN(manufactured by Hoshin Sangyosho K. K.) 1

[0053] Distance from lamp pipe wall: 300 mm

[0054] UV value at stable time: 2300 μW/cm2 (Light receiving meterTopcon UVR-2)

[0055] Test container/Quantity of bacteria liquid: 90 mm watch-glassshaped plate/1 ml n=3 (Result in Table: Number of bacteria in 1 m 1)

[0056] Concentration of the test fungi: 10³ to 10⁴/ml UV radiation time(sec): 0, 26, 39, 78, 156

[0057] Quantity of UV radiation (μW·s/cm2): Result was shown in Table.

[0058] Adjustment of test bacteria: Dilution of acquired bacterialliquid.

[0059] Counting bacterial number: Agar dilution method

[0060] Culture condition: Normal agar nutrient medium 35±1° C. 96 hours

[0061] (5) Result

[0062] Result of Inactivation test TABLE 1 UV Radiation UV RadiationTime Quantity (sec) (μW · s/cm²) Test 1 Test 2 Test 3 0 0 1.0 × 10⁴ 8.9× 10³ 8.9 × 10³ (No radiation) 26 (60000 μW/26 s) 1 0 0 6.0 × 10⁴ 39(90000 μW/39 s) 0 0 0 9.0 × 10⁴ 78 (180000 μW/78 s) 0 0 0 1.8 × 10⁵ 156(360000 μW/156 s) 0 0 0 3.6 × 10⁵

[0063] (6) Discussion

[0064] As shown in Table 1, it was considered that sterilization rate of10⁻⁴, namely not less than 60000 μW·s/cm2 of UV illuminance wasnecessary under the conditions of cultivation for 96 hours.

[0065] Experiment 2

[0066] (1) Title of the Test

[0067] Inactivation test by UV radiation sterilization lamp againstAspergillus nigar

[0068] (2) Object

[0069] For confirming tolerance of Aspergillus nigar against ultravioletrays, this test was carried out.

[0070] (3) Test Fungi and Quantity

[0071]Aspergillus nigar IF04414

[0072] Acquisition date: Sep. 21, 1999

[0073] (4) Test Condition

[0074] Ultraviolet rays sterilization lamp: SGL-1000T5 HOSHIN 1

[0075] Distance from the lamp pipe wall: 300 mm

[0076] UV value at stable time: 2300 μW/cm²

[0077] Test container/Quantity of fungi liquid: 90 mm watch-glass shapedplate/1 ml n=3 (Result in Table: Number of fungi in 1 ml)

[0078] Concentration of the test fungi: 10² to 10³/ml

[0079] UV radiation time (sec): 0, 7, 13, 26, 39

[0080] Quantity of UV radiation (μW·s/cm²): Result was described inTable.

[0081] Adjustment of test fungi: Dilution of acquired fungi liquid.

[0082] Counting number of fungi: Agar dilution method

[0083] Culture condition: potato dextrose agar nutrient medium 27±2° C.96 hours

[0084] (5) Result

[0085] Result of the inactivation test: [culture duration and degree ofcolony outbreak] TABLE 2 UV UV Radiation Radiation Time Quantity Test 1Test 2 Test 3 (sec) (μW · s/cm²) 48 hours 96 hours 48 hours 96 hours 48hours 96 hours  0 0 1.4 × 10³ 1.5 × 10³ 6.0 × 10² 6.0 × 10³ 1.1 × 10³1.1 × 10³  7 1.6 × 10⁴ 3.8 × 10² 3.8 × 10² 4.1 × 10² 4.1 × 10² 4.0 × 10²4.0 × 10² 13 3.0 × 10⁴ 3.0 × 10² 3.0 × 10² 3.1 × 10² 3.1 × 10² 2.8 × 10²2.8 × 10² 26 6.0 × 10⁴ 1.3 × 10² 1.4 × 10² 1.2 × 10² 1.2 × 10² 1.2 × 10²1.2 × 10² 39 9.0 × 10⁴ 5.8 × 10  6.2 × 10  5.1 × 10  5.5 × 10  5.7 × 10 6.7 × 10 

[0086] (6) Discussion

[0087] As shown in Table 2, there was no difference in sterilizationrate with culture for 48 hours and culture for 96 hours. Sterilizationrate of 99% was achieved with 90000 μW·s/cm 2. Since it is said thatabout 160000 μW·s/cm² is usually necessary, it is because of somewhatlower UV tolerance or less number of initial fungi as for the fungi thistime.

[0088] Experiment 3

[0089] 1) Title of the Test

[0090] Inactivation test by UV radiation sterilization lamp againstChaetomium globosum (Pretreatment with heat and hypochlorous acid)

[0091] 2) Object

[0092]Chaetomium globosum has very strong tolerance except against heat.Thus, before testing, the following processing was performed: thermaltreatment (heating at 30° C., 35° C., 40° C. each for 5 minutes), thentreatment with hypochlorous acid (1 ppm, 3 ppm, 5 ppm) and furthermoreUV radiation.

[0093] (3) Test Fungi and Quantity

[0094]Chaetomium globosum ATCC6205 1 strain

[0095] (4) Test Condition

[0096] UV sterilization lamp: SGL-1000T5 HOSHIN 1

[0097] Distance from this lamp pipe wall: 300 mm

[0098] UV value at stabile time: 2300 μW/cm²

[0099] Test container/quantity of fungi liquid: 90 mm watch-glass shapedplate/1 ml n=2 (Result in Table: Number of fungi in 1 ml)

[0100] Test fungi density: 10³ to 10⁴/ml

[0101] UV radiation time (sec)=0, 22, 44, 66

[0102] UV radiation quantity (μW·s/cm 2): Result was described in Table.

[0103] Adjustment of test fungi: Fungi were spread on potato dextroseagar plating medium one week before the test initiation. The fungi werecultured at 27±2° C., heated at 30° C., 36° C. and 40° C. each foraround 5 minutes, treated with each hypochlorous acid concentration bytouching for about 1 minute and subjected to UV radiation.

[0104] Counting number of fungi: Agar dilution method

[0105] Culture condition: Potato dextrose agar medium 27±2° C. 96 hours

[0106] (5) Result

[0107] Experiment 3-A

[0108] <1> Result of inactivation test: [Culture duration and degree ofcolony outbreak]

[0109] <2> Thermal treatment was made at 30° C., 36° C. and 40° C. eachfor about 5 minutes. The fungal cells were treated with eachhypochlorous acid concentration by touching for about 1 minute andsubjected to UV radiation. TABLE 3 hypo- UV UV chlorous RadiationRadiation acid Time Quantity concen- (sec) (μW · s/cm²) tration 30° C.36° C. 40° C. 0 0 1 ppm 2.5 × 10³ 2.0 × 10³ 1.6 × 10³ 1.6 × 10³ 1.5 ×10³ 2.5 × 10³ 3 ppm 2.1 × 10³ 1.9 × 10³ 1.9 × 10³ 2.1 × 10³ 1.0 × 10³1.6 × 10³ 5 ppm 7.7 × 10² 1.1 × 10³ 1.1 × 10³ 1.9 × 10³ 4.1 × 10³ 3.0 ×10³ 22 5.0 × 10⁴ 1 ppm 3.1 × 10² 1.9 × 10² 2.9 × 10² 3.3 × 10² 4.1 × 10²3.0 × 10² 3 ppm 3.6 × 10² 2.8 × 10² 4.2 × 10² 4.5 × 10² 3.4 × 10² 3.6 ×10² 5 ppm 2.7 × 10² 3.2 × 10² 2.1 × 10² 3.3 × 10² 3.3 × 10² 3.6 × 10² 441.0 × 10⁵ 1 ppm 2.0 × 10² 1.7 × 10² 2.9 × 10² 3.3 × 10² 4.2 × 10² 3.3 ×10² 3 ppm 4.3 × 10² 3.0 × 10² 3.1 × 10² 2.9 × 10² 2.4 × 10² 2.2 × 10² 5ppm 3.0 × 10² 3.6 × 10² 1.6 × 10² 2.7 × 10² 2.5 × 10² 2.7 × 10² 66 1.5 ×10⁵ 1 ppm 2.4 × 10² 1.6 × 10² 2.9 × 10² 2.8 × 10² 3.5 × 10² 3.0 × 10² 3ppm 2.2 × 10² 3.1 × 10² 3.1 × 10² 3.0 × 10² 2.2 × 10² 3.0 × 10² 5 ppm2.4 × 10² 3.2 × 10² 2.8 × 10² 2.0 × 10² 3.0 × 10² 2.8 × 10²

[0110] Explaining Experiment 3-A more in detail, it seems to have comeExperiments 3-B to 3-D.

[0111] Experiment 3-B

[0112] Test Condition

[0113] Thermal treatment at 30° C. for about 5 minutes+Treatment withhypochlorous acid TABLE 4 hypochlorous UV Radiation UV Radiation acidTime Quantity concentra- Test 1 Test 2 (sec) (μW · s/cm²) tion 48 hours96 hours 48 hours 96 hours  0 0 1 ppm 2.3 × 10³ 2.5 × 10³ 2.0 × 10³ 2.0× 10³ 3 ppm 1.8 × 10³ 1.9 × 10³ 2.0 × 10³ 2.1 × 10³ 5 ppm 5.2 × 10² 7.7× 10² 8.8 × 10² 1.1 × 10³ 22 5.0 × 10⁴ 1 ppm 2.6 × 10² 3.8 × 10² 1.5 ×10² 1.9 × 10² 3 ppm 3.2 × 10² 3.6 × 10² 2.6 × 10² 2.8 × 10² 5 ppm 2.6 ×10² 2.7 × 10² 3.1 × 10² 3.2 × 10² 44 1.0 × 10⁵ 1 ppm 1.6 × 10² 2.0 × 10²1.5 × 10² 1.7 × 10² 3 ppm 4.2 × 10² 4.3 × 10² 2.8 × 10² 3.0 × 10² 5 ppm2.9 × 10² 3.0 × 10² 3.4 × 10² 3.6 × 10² 66 1.5 × 10⁵ 1 ppm 2.1 × 10² 2.4× 10² 1.3 × 10² 1.6 × 10² 3 ppm 2.1 × 10² 2.2 × 10² 3.0 × 10² 3.1 × 10²5 ppm 2.3 × 10² 2.4 × 10² 3.1 × 10² 3.2 × 10²

[0114] Experiment 3-C

[0115] Test Condition: Thermal treatment at 36° C. for about 5minutes+Treatment with hypochlorous acid TABLE 5 UV UV RadiationRadiation hypochlorous Time Quantity acid Test 1 Test 2 (sec) (μW ·s/cm²) concentration 48 hours 96 hours 48 hours 96 hours  0 0 1 ppm 1.4× 10³ 1.6 × 10³ 1.6 × 10³ 1.6 × 10³ 3 ppm 1.8 × 10³ 1.9 × 10³ 2.0 × 10³2.1 × 10³ 5 ppm 1.1 × 10³ 1.1 × 10³ 1.9 × 10³ 1.9 × 10³ 22 5.0 × 10⁴ 1ppm 2.4 × 10² 2.9 × 10² 2.9 × 10² 3.3 × 10² 3 ppm 3.8 × 10² 4.2 × 10²4.1 × 10² 4.5 × 10² 5 ppm 1.9 × 10² 2.1 × 10² 1.9 × 10² 2.1 × 10² 44 1.0× 10⁵ 1 ppm 2.5 × 10² 2.9 × 10² 2.8 × 10² 3.3 × 10² 3 ppm 2.8 × 10² 3.1× 10² 2.7 × 10² 2.9 × 10² 5 ppm 1.5 × 10² 1.6 × 10² 2.6 × 10² 2.7 × 10²66 1.5 × 10⁵ 1 ppm 2.6 × 10² 2.9 × 10² 2.4 × 10² 2.8 × 10² 3 ppm 2.9 ×10² 3.1 × 10² 2.8 × 10² 3.0 × 10² 5 ppm 2.7 × 10² 2.8 × 10² 1.9 × 10²2.0 × 10²

[0116] Experiment 3-D

[0117] Test Condition

[0118] Thermal treatment at 40° C. for about 5 minutes+Treatment withhypochlorous acid TABLE 6 UV Radiation UV Radiation hypochlorous TimeQuantity acid Test 1 Test 2 (sec) (μW · s/cm²) concentration 48 hours 96hours 48 hours 96 hours  0 0 1 ppm 1.4 × 10³ 1.5 × 10³ 2.2 × 10³ 2.5 ×10³ 3 ppm 1.0 × 10³ 1.0 × 10³ 1.8 × 10³ 1.8 × 10³ 5 ppm 1.9 × 10³ 1.9 ×10³ 1.4 × 10³ 1.4 × 10³ 22 5.0 × 10⁴ 1 ppm 3.7 × 10² 4.1 × 10² 2.6 × 10²3.0 × 10² 3 ppm 3.1 × 10² 3.4 × 10² 3.0 × 10² 3.6 × 10² 5 ppm 3.2 × 10²3.3 × 10² 3.4 × 10² 3.6 × 10² 44 1.0 × 10⁵ 1 ppm 3.7 × 10² 4.2 × 10² 2.9× 10² 3.3 × 10² 3 ppm 2.1 × 10² 2.4 × 10² 2.0 × 10² 2.2 × 10² 5 ppm 2.4× 10² 2.5 × 10² 2.5 × 10² 2.7 × 10² 66 1.5 × 10⁵ 1 ppm 3.3 × 10² 3.5 ×10² 2.8 × 10² 3.0 × 10² 3 ppm 2.0 × 10² 2.2 × 10² 2.6 × 10² 3.0 × 10² 5ppm 2.9 × 10² 3.0 × 10² 2.7 × 10² 2.8 × 10²

[0119] (6) Discussion

[0120] As shown in Tables 3 and 4 to 6, there was no change due to thethermal change and concentration of chemicals, but a sterilization rateof 90% was achieved by using UV radiation.

[0121] Experiment 4

[0122] 1) Title of Test

[0123] Inactivation test by UV sterilization lamp against Chaetomiumglobosum

[0124] 2) Object

[0125] UV tolerance of Chaetomium globosum was ensured, and any changeon UV sterilization effect in case of fungi number: 10/100/1000 orderwas confirmed. Proliferation rate in culture for 48 hours and 96 hourswas examined.

[0126] (3) Test Fungi and Quantity

[0127]Chaetomium globosum ATCC6205 1 strain

[0128] (4) Test Condition

[0129] UV sterilization lamp: SGL-1000T5 HOSHIN 1

[0130] Distance from the lamp pipe wall: 300 mm

[0131] UV value at stable time: 2300 μW/cm²

[0132] Test container/Fungi liquid quantity: 90 mm watch-glass shapedplate/1 ml n=5 (Result in Table: Number of fungi in 1 ml)

[0133] Test fungi density: 10, 10², 10³/ml

[0134] UV radiation time (sec): 0, 22, 44, 66

[0135] UV radiation quantity (μW·s/cm2): Result was described in Table.

[0136] Adjustment of Test fungi: Fungi were spread on a potato dextroseagar plating medium 1 week before the test initiation, and the fungiwere cultured at 27±2° C. and provided for the test.

[0137] Counting number of fungi: Agar dilution method

[0138] Culture condition: potato dextrose agar medium, 27±2° C., 96hours

[0139] (5-1) Result 4A-1

[0140] <1> Result of the inactivation test

[0141] <2> Fungi density: 10 order/ml TABLE 7 UV Radia- UV tionRadiation Average Time Quantity (Sterilization (sec) (μW · s/cm²) Test 1Test 2 Test 3 Test 4 Test 5 rate %)  0 0 4.0 × 10 4.1 × 10 5.5 × 10 4.8× 10 3.4 × 10 4.4 × 10 22 5.0 × 10⁴ 1.1 × 10 1.7 × 10 1.7 × 10 1.2 × 101.4 × 10 1.4 × 10(68.2) 44 1.0 × 10⁵ 1.7 × 10 1.1 × 10 1.0 × 10 8 1.2 ×10 1.2 × 10(72.7) 66 1.5 × 10⁵ 1.3 × 10 1.3 × 10 1.5 × 10 1.6 × 10 1.1 ×10 1.1 × 10(68.2)

[0142] Culture duration 96 hours

[0143] (5-2) Result 4A-2

[0144] <1> Result of the inactivation test [Culture duration and degreeof colony outbreak]

[0145] <2> Fungi density: 10 order/ml TABLE 8 UV Radiation UV RadiationQuantity Time (sec) (μW · s/cm²) * Test 1 Test 2 Test 3 Test 4 Test 5  00 a 3.9 × 10 4.0 × 10 5.2 × 10 4.7 × 10 3.0 × 10 b 4.0 × 10 4.1 × 10 5.5× 10 4.8 × 10 3.4 × 10 22 5.0 × 10⁴ a 1.1 × 10 1.7 × 10 1.7 × 10 1.2 ×10 1.2 × 10 b 1.1 × 10 1.7 × 10 1.7 × 10 1.2 × 10 1.4 × 10 44 1.0 × 10⁵a 1.4 × 10 1.0 × 10 9 8 1.2 × 10 b 1.7 × 10 1.1 × 10 1.0 × 1.0 8 1.2 ×10 66 1.5 × 10⁵ a 1.0 × 10 1.3 × 10 1.5 × 10 1.6 × 10 1.0 × 10 b 1.3 ×10 1.3 × 10 1.5 × 10 1.6 × 10 1.1 × 10

[0146] TABLE 9 UV Radia- UV Average tion Radiation (Sterili- TimeQuantity zation (sec) (μW · s/cm²) Test 1 Test 2 Test 3 Test 4 Test 5rate %)  0 0  2.8 × 10²  3.2 × 10²  3.3 × 10²  3.2 × 10²  2.9 × 10²  3.1× 10² 22 5.0 × 10⁴ 5.1 × 10 6.7 × 10 7.6 × 10  1.1 × 10² 8.9 × 10 7.9 ×10 (84.2) 44 1.0 × 10⁵ 4.3 × 10 5.8 × 10 5.6 × 10 8.5 × 10 7.8 × 10 6.4× 10 (79.4) 66 1.5 × 10⁵ 2.7 × 10 6.5 × 10 5.3 × 10 3.7 × 10 4.9 × 104.9 × 10 (84.2)

[0147] (5-4) Result 4B-2

[0148] <1> Result of the Inactivation test [culture duration and degreeof colony outbreak]

[0149] <2> Fungi density: 10² order/ml (test) TABLE 10 UV UV RadiationRadiation Time Quantity (sec) (μW · s/cm²) * Test 1 Test 2 Test 3 Test 4Test 5  0 0 a  2.8 × 10²  3.2 × 10²  3.3 × 10²  3.2 × 10²  2.8 × 10² b 2.8 × 10²  3.2 × 10²  3.3 × 10²  3.2 × 10²  2.9 × 10² 22 5.0 × 10⁴ a4.9 × 10 6.7 × 10 7.3 × 10  1.1 × 10² 8.8 × 10 b 5.1 × 10 6.7 × 10 7.6 ×10  1.1 × 10² 8.9 × 10 44 1.0 × 10⁵ a 4.1 × 10 5.6 × 10 5.5 × 10 8.5 ×10 7.8 × 10 b 4.3 × 10 5.8 × 10 5.6 × 10 8.5 × 10 7.8 × 10 66 1.5 × 10⁵a 2.7 × 10 6.4 × 10 5.3 × 10 3.7 × 10 6.1 × 10 b 2.7 × 10 6.5 × 10 5.3 ×10 3.7 × 10 6.1 × 10

[0150] TABLE 11 UV UV Radia- Radiation Average tion Quantity (Sterili-Time (μW · s/ zation (sec) cm²) Test 1 Test 2 Test 3 Test 4 Test 5 rate%)  0 0 1.9 × 10³ 1.7 × 10³ 2.1 × 10³ 1.9 × 10³ 1.9 × 10³ 1.9 × 10³ 225.0 × 10⁴ 5.2 × 10² 4.4 × 10² 5.6 × 10² 5.2 × 10² 7.2 × 10² 5.5 × 10²(71.1) 44 1.0 × 10⁵ 5.8 × 10² 6.6 × 10² 7.8 × 10² 4.8 × 10² 5.6 × 10²6.1 × 10² (67.9) 66 1.5 × 10⁵ 5.2 × 10² 4.2 × 10² 4.0 × 10² 6.0 × 10²7.8 × 10² 5.4 × 10² (71.6)

[0151] (5-6) Result 4C-2

[0152] <1> Result of the inactivation test [Culture duration and degreeof colony outbreak]

[0153] <2> Fungi density: 10³ order/ml TABLE 12 UV UV RadiationRadiation Time Quantity (sec) (μW · s/cm²) * Test 1 Test 2 Test 3 Test 4Test 5  0 0 a 1.9 × 10³ 1.7 × 10³ 2.1 × 10³ 1.9 × 10³ 1.9 × 10³ b 1.9 ×10³ 1.7 × 10³ 2.1 × 10³ 3.9 × 10³ 1.9 × 10³ 22 5.0 × 10⁴ a 5.2 × 10² 4.4× 10² 5.6 × 10² 5.2 × 10² 7.2 × 10² b 5.2 × 10² 4.4 × 10² 5.6 × 10² 5.2× 10² 7.2 × 10² 44 1.0 × 10⁵ a 5.8 × 10² 6.4 × 10² 7.6 × 10² 4.6 × 10²5.4 × 10² b 5.8 × 10² 6.6 × 10² 7.8 × 10² 4.8 × 10² 5.6 × 10² 66 1.5 ×10⁵ a 5.2 × 10² 4.2 × 10² 3.8 × 10² 6.0 × 10² 7.4 × 10² b 5.2 × 10² 4.2× 10² 4.0 × 10² 6.0 × 10² 7.8 × 10²

[0154] As shown in Tables 7, 9 and 11, UV tolerance of Chaetomiumglobosum lowered its initial order, but there was not influence andchange on the sterilization effect any more, even if UV quantity wasraised. Further, no marked proliferation of fungi once sterilized wasobserved in 96 hours, as shown in Tables 8, 10 and 12.

[0155] Experiment 5

[0156] (1) Title of Test

[0157] Inactivation test by UV sterilization lamp against Chaetomiumglobosum

[0158] (2) Object

[0159] UV tolerance of Chaetomium globosum was ensured by irradiatingstrong UV over the fungi, and fungi proliferation rate after culturingthe mold for 48 hours and 96 hours, which had been sterilized by thestrong UV radiation, was examined.

[0160] (3) Test Fungi and Quantity

[0161]Chaetomium globosum ATCC6205 1 strain

[0162] (4) Test Condition

[0163] UV sterilization lamp: SGL-1000T5 HOSHIN 1

[0164] Distance from the lamp pipe wall: 300 mm

[0165] UV value at stable time: 2300 μW/cm²

[0166] Test container/Fungi liquid quantity: 90 mm watch-glass shapedplate/1 ml n=3 (Result in Table: Number of fungi in 1 ml)

[0167] Test fungi density: 10³ to 10⁴/ml

[0168] UV radiation time (sec): 0, 22, 44, 65, 87, 109, 130

[0169] UV radiation quantity (μW·s/cm2): Result was described in Table.

[0170] Adjustment of Test fungi: Fungi were spread on potato dextroseagar plating medium 1 week before the test initiation, and the fungiwere cultured at 27±2° C. and provided for the test.

[0171] Counting number of fungi: Agar dilution method

[0172] Culture condition: potato dextrose agar medium, 27±2° C., 96hours

[0173] (5-1) Result 5-A

[0174] Result of the inactivation test TABLE 13 UV Radiation UVRadiation Time Quantity (sec) (μW · s/cm²) Test 1 Test 2 Test 3 0 0 4.9× 10³ 3.7 × 10³ 4.3 × 10³ 22 5.0 × 10⁴ 1.3 × 10² 1.4 × 10² 1.5 × 10² 441.0 × 10⁵ 1.0 × 10² 1.0 × 10² 1.2 × 10² 65 1.5 × 10⁵ 4.6 × 10 4.5 × 105.7 × 10 87 2.0 × 10⁵ 4.7 × 10 7.2 × 10 4.2 × 10 109 2.5 × 10⁵ 4.6 × 104.0 × 10 3.6 × 10 130 3.0 × 10⁵ 5.2 × 10 3.8 × 10 5.2 × 10

[0175] Culture duration 96 hours

[0176] (5-2) Result 5-B

[0177] Result of the inactivation test [Culture duration and degree ofcolony outbreak] TABLE 14 UV Radiation UV Radiation Time Quantity Test 1Test 2 Test 3 (sec) (μW · s/cm²) 48 hours 96 hours 48 hours 96 hours 48hours 96 hours  0 0  2.9 × 10³  4.9 × 10³  3.0 × 10³  3.7 × 10³  2.7 ×10³  4.3 × 10³  22 5.0 × 10⁴  1.2 × 10²  1.3 × 10²  1.3 × 10²  1.4 × 10² 1.3 × 10²  1.5 × 10²  44 1.0 × 10⁵ 9.1 × 10  1.0 × 10² 8.0 × 10  1.0 ×10²  1.0 × 10²  1.2 × 10²  65 1.5 × 10⁵ 3.7 × 10 4.6 × 10 3.1 × 10 4.5 ×10 2.3 × 10 5.7 × 10  87 2.0 × 10⁵ 3.2 × 10 4.7 × 10 6.6 × 10 7.2 × 102.4 × 10 4.2 × 10 109 2.5 × 10⁵ 2.6 × 10 4.6 × 10 2.1 × 10 4.0 × 10 2.3× 10 3.6 × 10 130 3.0 × 10⁵ 2.6 × 10 5.2 × 10 4.2 × 10 3.8 × 10 4.4 × 105.2 × 10

[0178] (6) Discussion

[0179] As shown in Table 13, no more effect than 90% by 50 mW, 99% by200 mW and 99% by 300 mW was seen even by raising UV radiation. Further,there was hardly observed any difference between culturing for 48 hoursand 96 hours.

[0180] Experiment 6

[0181] (1) Title of Test

[0182] Inactivation test by UV sterilization lamp against Chaetomiumglobosum

[0183] (2) Object

[0184] UV tolerance was ensured by irradiating very strong UV overChaetomium globosum, and fungi proliferation rate after culturing thefungi for 48 hours and 96 hours, which had been sterilized by the strongUV radiation was examined.

[0185] (3) Test Fungi and Quantity Chaetomium globosum ATCC6205 1 strain

[0186] (4) Test Condition

[0187] UV sterilization lamp: SGL-1000T5 HOSHIN 1

[0188] Distance from the lamp pipe wall: 300 mm

[0189] UV value at stable time: 2300 μW/cm²

[0190] Test container/Fungi liquid quantity: 90 mm watch-glass shapedplate/1 ml n=3 (Result in Table: Number of fungi in 1 ml)

[0191] Test fungi density: 10³ to 10⁴/ml

[0192] UV radiation time (sec): 0, 130, 174, 218, 261, 305, 348,392, 435

[0193] UV radiation quantity (μW·s/cm²): Result was described in Table.

[0194] Adjustment of Test fungi: Fungi were spread on potato dextroseagar plating medium 1 week before the test initiation, and the fungiwere cultured at 27±2° C. and provided for the test.

[0195] Counting number of fungi: Agar dilution method

[0196] Culture condition: potato dextrose agar medium, 27±2° C., 96hours

[0197] (5-1) Result 6-A

[0198] Result of the inactivation test TABLE 15 UV Radiation UVRadiation Time Quantity (sec) (μW · s/cm²) Test 1 Test 2 Test 3 0 0 9.6× 10³ 1.1 × 10⁴ 1.0 × 10⁴ 130 3.0 × 10⁵ 3.7 × 10² 3.7 × 10² 6.0 × 10²174 4.0 × 10⁵ 1.3 × 10² 2.0 × 10² 2.2 × 10² 218 5.0 × 10⁵ 8.1 × 10 2.0 ×10² 1.1 × 10² 261 6.0 × 10⁵ 1.8 × 10² 3.4 × 10 1.3 × 10² 305 7.0 × 10⁵6.8 × 10 8.3 × 10 9.3 × 10 348 8.0 × 10⁵ 8.6 × 10 6.2 × 10 9.4 × 10 3929.0 × 10⁵ 5.3 × 10 5.7 × 10 6.0 × 10 435 1.0 × 10⁶ 7.1 × 10 4.6 × 10 5.1× 10

[0199] Culture duration 96 hours

[0200] (5-2) Result 6-B

[0201] Result of the inactivation test [Culture duration and degree ofcolony outbreak] TABLE 16 UV Radiation UV Radiation Time Quantity Test 1Test 2 Test 3 (sec) (μW · s/cm²) 48 hours 96 hours 48 hours 96 hours 48hours 96 hours  0 0  8.5 × 10³  9.6 × 10³  8.7 × 10³  1.1 × 10⁴  9.1 ×10³  1.0 × 10⁴ 130 3.0 × 10⁴  3.7 × 10²  3.7 × 10²  3.6 × 10²  3.7 × 10² 5.8 × 10²  6.0 × 10² 174 4.0 × 10⁵  1.3 × 10²  1.3 × 10²  1.9 × 10² 2.0 × 10²  2.2 × 10²  2.2 × 10² 218 5.0 × 10⁵ 7.7 × 10 8.1 × 10  2.0 ×10²  2.0 × 10²  1.1 × 10²  1.1 × 10² 261 6.0 × 10⁵  1.7 × 10²  1.8 × 10²3.1 × 10 3.4 × 10  1.2 × 10²  1.3 × 10² 305 7.0 × 10⁵ 6.6 × 10 6.8 × 108.1 × 10 8.3 × 10 8.8 × 10 9.3 × 10 348 8.0 × 10⁵ 7.9 × 10 8.6 × 10 5.7× 10 6.2 × 10 9.1 × 10 9.4 × 10 392 9.0 × 10⁵ 4.9 × 10 5.3 × 10 5.4 × 105.7 × 10 5.7 × 10 6.0 × 10 435 1.0 × 10⁶ 6.4 × 10 7.1 × 10 4.1 × 10 4.6× 10 4.7 × 10 5.1 × 10

[0202] (6) Discussion

[0203] As shown in Table 15, sterilization rate was not raised even byirradiating strong UV rays in case of fungi number below 100 order,showing almost the same result as in higher UV radiation. Further, therewas hardly observed any difference between culturing for 48 hours and 96hours.

[0204] Experiment 7

[0205] (1) Title of Test

[0206] Inactivation test by UV sterilization lamp against Chaetomiumglobosum

[0207] (2) Object

[0208] Thermal tolerance against Chaetomium globosum was ensured, and byperforming further UV radiation as it was, fungi proliferation rateafter culturing the fungi for 48 hours and 96 hours, which had beensterilized was examined.

[0209] (3) Test Fungi and Quantity

[0210]Chaetomium globosum ATCC6205 1 strain

[0211] (4) Test Condition

[0212] UV sterilization lamp: SGL-1000T5 HOSHIN 1

[0213] Distance from the lamp pipe wall: 300 mm

[0214] UV value at stable time: 2300 μW/cm²

[0215] Test container/Fungi liquid quantity: 90 mm watch-glass shapedplate/1 ml n=2 (Result in Table: Number of fungi in 1 ml)

[0216] Test fungi density: 10³ to 10⁴/ml

[0217] UV radiation time (sec): 0, 22, 44, 66

[0218] UV radiation quantity (μW·s/cm2): Result was described in Table.

[0219] Adjustment of Test fungi: Fungi were spread on potato dextroseagar plating medium 1 week before the test initiation. The fungi werecultured at 27±2° C., kept at 35° C., 40° C., 45° C., 50° C. and 60° C.each for about 5 minutes and subjected to UV radiation as it was.

[0220] Counting number of fungi: Agar dilution method

[0221] Culture condition: potato dextrose agar medium, 27±2° C., 96hours

[0222] (5-1) Result 7-A

[0223] <1> Result of the Inactivation test [culture duration and degreeof colony outbreak]

[0224] <2> Fungi heated at 35° C., 40° C., 45° C., 50° C., and 60° C.each for about 5 minutes TABLE 17 UV UV Radiation Radiation TimeQuantity (sec) (μW · s/cm²) n 35° C. 40° C. 45° C. 50° C. 60° C.  0 0 12.6 × 10³ 2.2 × 10³ 2.1 × 10³ 1.4 × 10³ 2 2 3.0 × 10³ 2.8 × 10³ 2.8 ×10³ 1.4 × 10³ 3 22 5.0 × 10⁴ 1 2.2 × 10² 2.3 × 10² 2.1 × 10² 2.7 × 10² 12 2.3 × 10² 1.9 × 10² 2.1 × 10² 1.5 × 10² 1 44 1.0 × 10⁵ 1 2.5 × 10² 2.2× 10² 2.2 × 10² 1.4 × 10² 0 2 1.8 × 10² 1.7 × 10² 1.6 × 10² 1.3 × 10² 166 1.5 × 10⁵ 1 1.5 × 10² 2.4 × 10² 2.4 × 10² 1.9 × 10² 0 2 1.9 × 10² 1.1× 10² 1.3 × 10² 1.4 × 10² 0

[0225] (5-2) Result 7A-1

[0226] Thermal treatment at 35° C. for 5 minutes TABLE 18 UV Radia- tionUV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²) 48 hours 96hours 48 hours 96 hours  0 0 2.5 × 10³ 2.6 × 10³ 2.9 × 10³ 3.0 × 10³ 225.0 × 10⁴ 2.1 × 10² 2.2 × 10² 2.3 × 10² 2.3 × 10² 44 1.0 × 10⁵ 2.5 × 10²2.5 × 10² 1.7 × 10² 1.8 × 10² 66 1.5 × 10⁵ 1.5 × 10² 1.5 × 10² 1.9 × 10²1.9 × 10²

[0227] (5-3) Result 7A-2

[0228] Thermal treatment at 40° C. for 5 minutes TABLE 19 UV Radia- tionUV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²) 48 hours 96hours 48 hours 96 hours  0 0 2.2 × 10³ 2.2 × 10³ 2.8 × 10³ 2.8 × 10³ 225.0 × 10⁴ 2.3 × 10² 2.3 × 10² 1.8 × 10² 1.9 × 10² 44 1.0 × 10⁵ 2.1 × 10²2.2 × 10² 1.7 × 10² 1.7 × 10² 66 1.5 × 10⁵ 2.3 × 10² 2.4 × 10² 1.1 × 10²1.1 × 10²

[0229] (5-4) Result 7A-3

[0230] Thermal treatment at 45° C. for 5 minutes TABLE 20 UV Radia- tionUV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²) 48 hours 96hours 48 hours 96 hours  0 0 2.1 × 10³ 2.1 × 10³ 2.7 × 10³ 2.8 × 10³ 225.0 × 10⁴ 2.1 × 10² 2.0 × 10² 2.0 × 10² 2.1 × 10² 44 1.0 × 10⁵ 2.1 × 10²1.6 × 10² 2.2 × 10² 1.6 × 10² 66 1.5 × 10⁵ 2.4 × 10² 1.3 × 10² 2.4 × 10²1.3 × 10²

[0231] (5-5) Result 7A-4

[0232] Thermal treatment at 50° C. for 5 minutes TABLE 21 UV Radia- tionUV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²) 48 hours 96hours 48 hours 96 hours  0 0 1.4 × 10³ 1.4 × 10³ 1.4 × 10³ 1.4 × 10³ 225.0 × 10⁴ 2.6 × 10² 2.7 × 10² 1.5 × 10² 1.5 × 10² 44 1.0 × 10⁵ 1.4 × 10²1.4 × 10² 1.3 × 10² 1.3 × 10² 66 1.5 × 10⁵ 1.9 × 10² 1.9 × 10² 1.4 × 10²1.4 × 10²

[0233] (5-6) Result 7A-5

[0234] Thermal treatment at 60° C. for 5 minutes TABLE 22 UV Radia- tionUV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²) 48 hours 96hours 48 hours 96 hours  0 0 2 3 2 3 22 5.0 × 10⁴ 1 1 1 1 44 1.0 × 10⁵ 01 0 1 66 1.5 × 10⁵ 0 0 0 0

[0235] (6) Discussion

[0236] As shown in Tables 17 to 21, there was almost no sterilizationeffect up to 50° C. on thermal tolerance of Chaetomium globosum. Asshown in Tables 17 and 22, the effect was 99.9% at 60° C. Then, 50mW/100 mW UV radiation was effective. Survived number near zero can beachieved by UV radiation of about 150 mW.

[0237] Experiment 8

[0238] (1) Title of Test

[0239] Inactivation test (thermal post-treatment) by UV sterilizationlamp against Chaetomium globosum

[0240] (2) Object

[0241] Thermal tolerance and UV radiation test against Chaetomiumglobosum were ensured in the former stage, and in this case, UVradiation, followed by heating, was examined on the contrary, whileobserving the difference between this case and the former stage.Further, whether there is any growth of fungi once sterilized orremaining at that time by culturing for 48 and 96 hours respectively wasalso examined.

[0242] (3) Test Fungi and Quantity

[0243]Chaetomium globosum ATCC6205 1 strain

[0244] (4) Test Condition

[0245] UV sterilization lamp: SGL-1000T5 HOSHIN 1

[0246] Distance from the lamp pipe wall: 300 mm

[0247] UV value at stable time: 2300 μW/cm²

[0248] Test container/Fungi liquid quantity: 90 mm watch-glass shapedplate/1 ml n=2

[0249] (Result in Table: Number of fungi in 1 m 1)

[0250] Test fungi density: 10³ to 10⁴/ml

[0251] UV radiation time (sec): 0, 22, 44, 66

[0252] UV radiation quantity (μW·s/cm²): Result was described in Table.

[0253] Adjustment of Test fungi: Fungi were spread on a potato dextroseagar plating medium 1 week before the test initiation, and the fungiwere cultured at 27±2° C., subjected to UV radiation and heated at 45°C., 50° C. and 60° C. each for 5 minutes.

[0254] Counting number of fungi: Agar dilution method

[0255] Culture condition: potato dextrose agar medium, 27±2° C., 96hours

[0256] (5-1) Result 8-A

[0257] <1> Result of the inactivation test [culture duration and degreeof colony outbreak]

[0258] <2> After UV radiation, thermal treatment at 45° C., 50° C. and60° C. each was done for 5 minutes. TABLE 23 UV UV Radiation RadiationThermal Thermal Thermal Time Quantity treating time treating timetreating time (sec) (μW · s/cm²) n 45° C. 50° C. 60° C.  0 0 1 5.0 × 10²3.0 × 10² 3 2 8.0 × 10² 4.0 × 10² 0 22 5.0 × 10⁴ 1 2.1 × 10² 2.3 × 10² 02 2.0 × 10² 7.9 × 10  0 44 1.0 × 10⁵ 1 1.5 × 10² 1.5 × 10² 0 2 8.7 × 10 9.5 × 10  0 66 1.5 × 10⁵ 1 1.2 × 10² 7.8 × 10  0 2 8.8 × 10  8.4 × 10  0

[0259] (5-2) Result 8A-1

[0260] Thermal treatment at 45° C. for about 5 minutes TABLE 24 UVRadia- tion UV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²)48 hours 96 hours 48 hours 96 hours  0 0 5.0 × 10² 5.0 × 10² 8.0 × 10²8.0 × 10² 22 5.0 × 10⁴ 2.1 × 10² 2.1 × 10² 2.0 × 10² 2.0 × 10² 44 1.0 ×10⁵ 1.5 × 10² 1.5 × 10² 7.9 × 10  8.7 × 10  66 1.5 × 10⁵ 1.2 × 10² 1.2 ×10² 8.3 × 10  8.8 × 10 

[0261] (5-3) Result 8A-2

[0262] Thermal treatment at 50° C. for about 5 minutes TABLE 25 UVRadia- tion UV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²)48 hours 96 hours 48 hours 96 hours  0 0  3.0 × 10²  3.0 × 10²  2.0 ×10²  4.0 × 10² 22 5.0 × 10⁴  2.2 × 10²  2.3 × 10² 7.4 × 10 7.9 × 10 441.0 × 10⁵ 8.9 × 10 9.5 × 10  1.4 × 10²  1.5 × 10² 66 1.5 × 10⁵ 7.1 × 107.8 × 10 7.5 × 10 8.4 × 10

[0263] (5-4) Result 8A-3

[0264] Thermal treatment at 60° C. for about 5 minutes TABLE 26 UVRadia- tion UV Radiation Time Quantity Test 1 Test 2 (sec) (μW · s/cm²)48 hours 96 hours 48 hours 96 hours  0 0 3 3 3 3 22 5.0 × 10⁴ 0 0 0 0 441.0 × 10⁵ 0 0 0 0 66 1.5 × 10⁵ 0 0 0 0

[0265] (6) Discussion

[0266] As shown in Table 23 and 24, an effect of 59% was attained by 100mW of UV radiation before the thermal treatment at around 45° C., andthere was not seen any considerable change by the thermal treatment at50° C., even if 100 mW of UV was irradiated prior to heating, as shownin Tables 23 and 25. However, it was confirmed that the remainingChaetomium globosum was close to zero by holding it at 60° C. for 5minutes after the radiation of 50 mW UV, as shown in Tables 23 and 26.Thus, it was confirmed that Chaetomium globosum was killed byirradiating 50 mW/100 mW UV and heating it at 60° C. for 5 minutes.

[0267] Accordingly, practical embodiments of the present invention havebeen explained, but the scope of the invention should not be limited tothem. For example, sterilization is performed by irradiating UV with UVRadiation Device 3 from about Device 1 and pouring heated water byHeated Water Supplying Device 4 in the embodiments. However, thesterilization may be also performed by treating it from other directionssuch as sideward, downwards, inside, etc. or sterilizing the wholeContainer 1. Further, as means for heating Container 1, heated water isused herein. However, not only medium heating means using hot wind oranother heated medium may be, of course, applied but alsoelectromagnetic wave heating means irradiating infrared light, farinfrared light, laser beam, or other electromagnetic wave may beadopted. In this case, it is preferable to irradiate not less than5.0×10⁴ μW·s/cm² of UV in wave length of 180 nm to 480 nm. Further, heatmay be applied by irradiating UV rays over the air, which would be thesource of hot wind.

[0268] Moreover, when a longer time for heating is needed because thetemperature for applying heat against Container 1 is as low as 55° C. to85° C., it may be preferable to take means of establishing a passagewayof spiral structure and so on in order to find time to heat. On theother hand, it may be, of course, possible to shorten the time neededfor applying heated medium or the time needed for irradiating theelectromagnetic wave if the temperature of heated medium is 85° C. to99° C., a sterilization target such as fungi etc. itself is heated at85° C. to 99° C. or further higher temperature is applied.

[0269] In particular, in case of heating a sterilization target, a timeof 5 to 6 minutes is necessary for applying heating medium orirradiating electromagnetic beam if the temperature of the heated mediumor the sterilization target is brought at 55° C. to 85° C. within oneminute soon after irradiating UV rays. When heated medium or asterilization target is brought to temperature of 85° C. to 99° C. onthe contrary, shorter time is needed to accomplish the objective, suchas 2 to 30 seconds for applying heated medium or irradiatingelectromagnetic beam.

[0270] In this way, the present invention can take various ways withinthe scope that does not deviate from the purpose of the invention.

Industrial Applicability

[0271] According to a method of sterilizing fungi and/or bacteria in aspore state in the present invention, by irradiating ultraviolet rays tothe portions to be sterilized of target-adhering things such ascontainers, packing materials, conveying tools, etc. andtarget-containing things such as liquid, air, raw materials, etc. tohurt the fungi and so on adhering onto the target-adhering things andthe fungi and so on contained in the target-containing things, followedby heating the fungi and so by applying heated medium such as heatedwater, hot wind, etc. over the fungi and so on, or by heating theportions to be sterilized in the target-containing things to givethermal stimulation to the fungi and so on adhering onto thetarget-adhering things and the fungi and so on contained in thetarget-containing things followed by irradiating ultraviolet rays overthe fungi and so on, fungi and bacteria in a spore state can besterilized effectively by collaboration of UV rays and heat to preventcontamination of the target-adhering things, target-containing thingsand circumstances thereof.

[0272] Further, according to a sterilizer against fungi and/or bacteriain a spore state in the present invention, there can be provided adevice enabling to effectively, simply and certainly sterilize the fungiand so on/or bacteria in a spore state which are strong against UV raysbut fragile against heat and the fungi and so on which are strongagainst heat but fragile against UV rays by collaboration of UV rays andheat. The sterilizer comprises UV radiation means and heating means forirradiating ultraviolet rays over the sterilization target to hurt itand heating the sterilization target, or for heating the sterilizationtarget to give thermal stimulation to the sterilization target andirradiating UV rays over the sterilization target.

Description of Reference Numerals

[0273] 1 . . . CONTAINER

[0274] 2 . . . UV IRRADIATION ZONE

[0275] 3 . . . HEAT TREATMENT ZONE

[0276] 4 . . . HEATING DEVICE

[0277] 10 . . . GERM-FREE FILLING DEVICE

[0278] 11 . . . PRELIMINARY WASHING DEVICE

[0279] 15 . . . FILLING DEVICE

[0280] 18, 19, 20, 21 . . . STERILIZER

1. A method of sterilizing fungi and/or bacteria in a spore state whichcomprises irradiating ultraviolet rays over portions to be sterilized ontarget-adhering things such as containers, packing materials, conveyingtools, etc. and on target-containing things such as liquid, air, rawmaterials, etc. to hurt sterilization targets such as fungi and/orbacteria in a spore state, adhering to the target-adhering things orcontained in the target-containing things, and then heating thesterilization targets to kill them.
 2. A method of sterilizing fungiand/or bacteria in a spore state which comprises heating portions to besterilized on target-adhering things such as containers, packingmaterials, conveying tools, etc. and on target-containing things such asliquid, air, raw materials, etc. to give thermal stimulation tosterilization targets such as fungi and/or bacteria in a spore state,adhering to the target-adhering things or contained in thetarget-containing things, and then irradiating ultraviolet rays over thesterilization targets to kill them.
 3. The method of sterilizing fungiand/or bacteria in a spore state according to claim 1 or 2, in which theultraviolet rays irradiation is performed by irradiating not less than5.0×10⁴ μW·s/cm² of ultraviolet rays in the wave length of from 180 nmto 480 nm.
 4. The method of sterilizing fungi and/or bacteria in a sporestate according to claim 1 or 2, in which the sterilization targets areheated by applying heated medium at 55° C. to 100° C.
 5. The method ofsterilizing fungi and/or bacteria in a spore state according to claim 1or 2, in which the sterilization targets are heated by heating thesterilization targets at 55° C. to 100° C. with use of electromagneticwave radiation.
 6. A sterilizer against fungi and/or bacteria in a sporestate comprising UV radiation means for irradiating ultraviolet raysover portions to be sterilized on target-adhering things such ascontainers, packing materials, conveying tools, etc. or ontarget-containing things such as liquid, air, raw materials, etc to hurtsterilization targets such as fungi and/or bacteria in a spore state,adhering to the target-adhering things or contained in thetarget-containing things, and heating means for heating thesterilization targets hurt by the UV radiation.
 7. A sterilizer againstfungi and bacteria in a spore state comprising heating means for heatingportions to be sterilized on target-adhering things such as containers,packing materials, conveying tools, etc. or in target-containing thingssuch as liquid, air, raw materials, etc. to give thermal stimulation tosterilization targets such as fungi and/or bacteria in a spore state,adhering to the target-adhering things or contained in thetarget-containing things, and UV radiation means for irradiatingultraviolet rays over the sterilization targets having received thethermal stimulation.
 8. The sterilizer against fungi and bacteria in aspore state according to claim 6 or 7, in which the heating means ismedium heating means for heating the sterilization targets by applyingheated medium such as heated water, hot wind, steam, etc. at temperatureranging from 55° C. to 100° C. to the sterilization targets.
 9. Thesterilizer against fungi and/or bacteria in a spore state according toclaim 6 or 7, in which the heating means is electromagnetic wave heatingmeans such as infrared light irradiating device, laser beam irradiatingdevice, etc. for heating the sterilization targets by irradiatingelectromagnetic wave to heat the sterilization targets at temperatureranging from 55° C. to 100° C.
 10. The sterilizer against fungi and/orbacteria in a spore state according to claim 6 or 7, in which the UVradiation means is a UV radiation device for irradiating not less than5.0×10⁴ μW·s/cm² of ultraviolet rays with wave length ranging from 180nm to 480 nm.